Aluminum Etchant Type A

Descrição detalhada : ALUMINUM ETCHANT - TYPE A. Standard aluminum etchant for use on silicon devices and other microelectronic applications.. Aluminum etchants are stable, non-toxic preparations used to etch aluminum metallizations on silicon devices and in integrated circuit applications. Aluminum contacts are defined, and interconnections are formed. These aluminum etchants, formulated with unique properties, easily overcome many of the difficulties experienced in aluminum etch processes.. The aluminum metallization and etching process using photo-lithographic techniques is basic to semiconductor and microelectronic technology. Aluminum etchants are highly compatible with commercial photoresists and permit delineation into high resolution patterns. Metal line width of 1 mil and separations less than 5 microns are feasible. High resolution is practical with these aluminum etchants because lifting of photoresist patterns does not occur and undercutting is minimized. Furthermore, the etchants do not attack silicon, silicon dioxide, silicon nitride or nichrome resistor films. . Two aluminum etchants are offered for use in microelectronics. Type A is recommended for use on silicon devices. Type D is recommended for use on gallium arsenide and gallium phosphide devices to avoid attack of the etchant on the intermetallic compound. It is also recommended for etching aluminum metallizations on nichrome thin film resistors.
Sinónimos : Aluminum etching solution for use on silicon devices
Armazenamento : Room Temperature
Embalagem : 1X500ML