Negative resist remover I

Descrição detalhada : Low pH formulation for removal of photoresist cured onto various substrates. Non-corrosive to metals and oxides. Does not contain chlorinated hydrocarbons, chromates, phenol, or phosphates. Performs well at room and elevated temperatures., Available as part of Negative Photoresist kit 654892
Armazenamento : 2-8C
Embalagem : 1X250ML