Phosphorus implant in silicon depth profile standard

Descrição detalhada : This Standard Reference Material (SRM) is intended for use in calibrating secondary ion response to minor and trace levels of phosphorus in a silicon matrix by the analytical technique of secondary ion mass spectrometry (SIMS). SRM 2133 is intended for calibrating the response of a SIMS instrument for phosphorus in a silicon matrix under a specific set of instrumental conditions. It may also be used by a laboratory as a transfer standard for the calibration of working standards of phosphorus in silicon. This SRM consists of a 1 cm x 1 cm single crystal silicon substrate that has been ion-implanted with the isotope 31P at a nominal energy of 100 keV. For more information, please refer to the COA and SDS.SRM 2133_cert SRM 2133 _SDS
Armazenamento : +15°C to +25°C
Embalagem : 1X1EA