Arsenic implant in silicon depth profile standard

Descrição detalhada : This Standard Reference Material (SRM) is intended for use in calibrating secondary ion response to minor and trace levels of arsenic in a silicon matrix by the analytical technique of secondary ion mass spectrometry (SIMS). It may also be used by a laboratory as a transfer standard for the calibration of working standards of arsenic in silicon.For more information, please refer to the SDS and COA.SRM 2134_cert SRM 2134 _SDS
Armazenamento : +15°C to +25°C
Embalagem : 1X1EA